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| Jump to Specific 3DASSM Topics Read Advanced Packaging (3/08) article, "The 3DASSM Consortium: An Industry/Academia Collaboration" Ceramic substrates were the basis of high performance IC packages until 1990. For cost and performance reasons, organic substrates have taken over since then. However, organic substrates seem to have reached their limits in wiring density, cost and thermo-mechanical performance such as warpage and thermal management. Recent advances in Si wafer as the substrate with TSV, replacing flipchip and wirebond, with embedded thin film components, in addition to its outstanding intrinsic thermal properties such as CTE and thermal conductivity, may allow part or the entire system to be made of silicon. This can be referred to as silicon package replacing organic package. There is yet another concept to silicon systems that can be referred to as seamless integration of IC with its front end and back end as well as thin film fanout wiring that is typically done with organic packages. All these concepts can be envisioned to lead to an all silicon system—Si for ICs, packages and boards. Silicon, however, presents several challenges to achieve this vision, such as its electrically conducting properties, high fabrication cost and reduced mechanical strength. The Microsystems Packaging Research Center (PRC) at the Georgia Institute of Technology (Atlanta, GA, USA), in partnership with Fraunhofer IZM (Berlin, Germany) and Korea Advanced Institute of Science and Technology (KAIST) (Daejeon, South Korea) will launch a global industry consortium titled 3D All Silicon System Module (3D-ASSM) in October, 2008. This consortium will explore and develop Si as the IC and system technology by assessing system level benefits, identifying the challenges of Si based systems, and by executing a focused cross-disciplinary research to address the challenges and exploit the advantages of such systems. The objectives will include system miniaturization, component integration, superior electrical and thermal performance, greater reliability, hetero-integration of components, reduced form factor, and low cost process innovations. A three phase execution strategy is envisioned for this program. In the first phase, the focus will be on key building block technologies in five thrust areas: 1) Electrical and thermal design and test. 2) Multilayer Si substrate. 3) Low cost TSV. 4) Embedded thin film actives and passives. 5) IC to Si package and to board interconnections. Approximately 20 projects have been proposed across these five thrust areas. At the end of the first phase, some technologies from these thrust areas will be integrated to demonstrate an advanced Si package such as a BGA as shown in Figure 1. The next phase will continue to enhance the building block technologies that were executed in the first phase including continuation of some projects or launching entirely new projects. The second phase will also deliver an integration which will be a more advanced and highly integrated Si module incorporating a majority of the various building block technologies developed in the first phase. Finally, the third and final phase will achieve a complete all Si system.
Prior to the launch of this global consortium, there will be four workshops held throughout the world to introduce the program to potential industrial partners. The first workshop was held on the campus of GeorgiaTech (Atlanta, GA) on March 11-12, 2008. There was a lot of interest with over 80 participants from 45 organizations attending this event. The workshop was highly interactive and useful in the shaping of the program. The general strategy of the program, as well as, first phase project details was shared during this first workshop. The next workshop will be held in May 5-6, 2008 in Berlin, Germany, where a revised set of projects and integration plans will be discussed. Subsequent workshops will be held in Japan on July 9, 2008 and Korea on July 11, 2008 prior to the launch of the consortium in fall 2008. For more information on this consortium please contact Dr. Ritwik Chatterjee (email: ritwik@ece.gatech.edu or phone: 1-404-385-7302).
(A) 3D All Silicon System Module Design
(B) Si Substrate with Multilayer Wiring and Shielded TSV
(C) Low Cost TSV
(D) Thin Film Active and Passive Components
(E) IC to Si Substrate-Board Interconnections and Reliability
(F) Advanced Thermal Solutions
Who Should Attend
Registration
Contacts Dr. Ritwik Chatterjee (PRC), ritwik@ece.gatech.edu |
Agenda 3DASSM Project Selection and Supply Chain Workshop (October 28-29, 2008) Program Selection Workshop (Tues., October 28, 2008) 8–9 AM: Registration 9–9:30 AM: Welcome: Goals of the Workshop - Co-Chairs: Prof. Rao Tummala, Prof. Reichl, Prof. Kim 9:30-10:30 AM: Proposed Initial Program - Co-Chairs: Prof. Rao Tummala, Prof. Reichl, Prof. Kim 10:30–11:00 AM: Break 11:00–12:00 AM: Industry Discussion 12-1:30 PM Lunch Beyond 3D Supply Chain (SC) Partnership Workshop 1:30–2:30 PM: Industry Feedback and Revised Proposal 2:30–3:30 PM: Initial Technical Program - Co-Chairs: Rolf Aschenberenner, Ritwik Chatterjee 3:30-3:45 PM: Coffee 3:45–4:45 PM: The Role of Supply Chain (SC) in 3DASSM
4:45–5:15 PM: Supply Chain Expectations – An Industry Perspective
5:15–5:45 PM: Invited SC Industry Speaker #1 5:45 – 6:15 PM: Invited SC Industry Speaker #2
Beyond 3D Supply Chain (SC) Partnership Workshop (cont.) (Wednesday, October 29, 2008) 8:30 - 10 AM: Finalize the Technical Program 10-10:30 AM Coffee 10:30-12 PM: Finalize Supply Chain Program
General Contact Information PHONE: 404-894-9097 POSTAL ADDRESS:
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